Valid for: 2021/22
Faculty: Faculty of Engineering, LTH
Decided by: PLED N
Date of Decision: 2021-04-19
Main field: Nanoscience.
Main field: Technology.
Compulsory for: MNAV1, N3
Elective for: E4, F4, F4-hn, F4-nf, MFOT1
Language of instruction: The course will be given in English
The purpose of this course is to provide fundamental knowledge about fabrication and characterization of semiconductor devices on the nanometer scale. The focus is set on modern materials and processing techniques with nanotechnology as a main theme. Most of the processes are general and are applied in traditional Si based IC technology as well as in advanced III-V technology and MEMS/NEMS fabrication.
Knowledge and understanding
For a passing grade the student must
Competences and skills
For a passing grade the student must
Materials properties of semiconductors. Device fabrication: process overviews, comparison between III/V and Si. Processes: Epitaxy, ion implantation, diffusion, film deposition, etching, lithography. Metal-oxide-semiconductor interfaces, which are of significant importance in a number of applications will be covered. Fabrication and applications of p-n junction diodes and their electronic and optoelectronic properties will be discussed. Fabrication and principles for MEMS/NEMS (micro/nano-electromechanical systems) will also be treated.
In a number of connected laboratory exercises, some of the covered process steps will be applied in order to make working devices. Since it is highly important that semiconductor processing is carried out in a clean and dust free environment, strong emphasis will be put on clean room work methods.
One individal lab-report (in English) covering all laboratory exercises i kursen.
Grading scale: TH - (U,3,4,5) - (Fail, Three, Four, Five)
Assessment: Written examination and approved laboratory exercises.
The examiner, in consultation with Disability Support Services, may deviate from the regular form of examination in order to provide a permanently disabled student with a form of examination equivalent to that of a student without a disability.
Parts
Code: 0117. Name: Processing and Device Technology.
Credits: 7,5. Grading scale: TH.
Code: 0217. Name: Laboratory Exercises and Report.
Credits: 0. Grading scale: UG.
Assumed prior knowledge: FFFF01 Electronic Materials or FFFF05 Solid State Physics or ESSF20 Physics of Devices.
The number of participants is limited to: 70
Selection: 1. Students for whom the course is compulsory are guaranteed admission
2. Completed university credits within the programme.
The course overlaps following course/s: FFF110
Course coordinator: Dr. Claes Thelander, claes.thelander@ftf.lth.se
Course homepage: http://www.nano.lth.se/ftf-cth/fff110
Further information: One laboratory report must be written in English.
It is mandatory to attend the first lecture in order to be admitted to the course.