Course syllabus

Avancerad framställning av nanostrukturer
Advanced Processing of Nanostructures

FFFN01, 7,5 credits, A (Second Cycle)

Valid for: 2014/15
Decided by: Education Board B
Date of Decision: 2014-04-08

General Information

Main field: Nanoscience.
Elective for: F4, F4-hn, F4-nf, N4-nf, N4-hn, N4-m
Language of instruction: The course will be given in English


The aim of the course is to give deep practical and theoretical knowledge of fabrication and characterisation of semiconductor nanostructures, which can be used in nanoelectronics, nanophotonics and life sciencies. Since the course is project-oriented, there will be a limited number of introduction lectures, instead the students will participate in the labs and in an extensive project work. Theoretical part of the course will be covered by self-studies. The focus of the course will be put on different material processing techniques, which are used today in nanotechnology, for example, electron beam lithography (EBL), focused ion beams (FIB), nanoimprint lithography (NIL), reactive ion etching (RIE) etc. The introductory labs are aimed at giving a "hand-on" knowledge of a safe work in the cleanrooms and some important technological methods used in semiconductor nanotechnology, such as EBL, NIL, scanning electron microscopy and others. After the laboratory excercises and safety training the students will get access to the cleanroom under the supervision of PhD-students and the lab staff, to take part in a research project work to learn practical details of nanofabrication and characterisation.

Learning outcomes

Knowledge and understanding
For a passing grade the student must

Competences and skills
For a passing grade the student must

Judgement and approach
For a passing grade the student must

realise the importance of cleanroom environment and use of suitable process steps for successful fabrication and characterization of nanostructures


Lectures, laboratory exercises and a project work

The introductory lectures will review different methods of nanofabrication such as electron beam lithography, focused ion beams, nanoimprint, self-assembly, soft lithography and others. The aim of the lectures is to introduce students to the subject of advanced nanofabrication and to guide them how to organize self-studies in an efficient way. The number of lectures is limited to 3 (totally 6 hours) and some time will be reserved at the lectures to discuss the material and get the feedback from the students. The study material for studies will be distributed among the students, it will include the recommended textbooks and suitable scientific review articles.

Prior to the laboratory exercises a special cleanroom and safety training will be organized for the students to provide them with a special knowledge about the correct behavior in the research cleanrooms of Lund Nano Lab and how to deal with chemicals and equipment in the lab. The laboratory exercises will be divided into three parts (cleanroom behavior and practical handling of samples and chemicals, scanning electron microscopy and electron beam lithography) to give the students some essential "hand-on" knowledge of the safe work habits in Lund Nano Lab. These exercises will be performed in smaller groups (maximum 3 persons per groups) in order to be able to learn practical things efficiently.

As a final and the biggest part of the course, course projects will be offered in order to deepen practical knowledge of the cleanroom work and learn advanced equipment and techniques. The course project will take 4-6 weeks and will focus on a specific research area, relevant to the research activity of the Division of Solid State Physics. Totally 3-4 course projects will be offered during the course. Actual duration of the project will depend on its complexity and will be adjusted accordingly. The project work will be supervised by PhD-students and/or the staff of the Lund Nano Lab. Regular communication and discussions with the students about the project work will be organized in order to monitor the project implementation. At the end of the project work a mini-conference with public presentation of the results will be organized.

Examination details

Grading scale: TH
Assessment: The assessment of the course will be performed by a written examination, approval of laboratory exercises and approval of project work


Admission requirements:

The number of participants is limited to: 12
Selection: 1. Degree project involving semiconductor processing. 2. At least 15 credits from the following courses: FFF021, FFF042, FAFN15, FFFN05, FFF115 and FFFN20. 3. Credits remaining for the degree.

Reading list

Contact and other information

Course coordinator: Docent Ivan Maximov,
Teacher: Dr Dmitry Suyatin,
Course homepage: