Course syllabus

Avancerad framställning av nanostrukturer
Advanced Processing of Nanostructures

FFFN01, 7,5 credits, A (Second Cycle)

Valid for: 2012/13
Decided by: Education Board 1
Date of Decision: 2012-03-22

General Information

Main field: Nanoscience.
Elective for: F4, F4-hn, F4-nf, MFOT1, MNAV1, N4-nf, N4-hn, N4-m
Language of instruction: The course might be given in English


The aim of the course is to give a deep knowledge of fabrication and characterization of nanostructures, which can be used in both nanoelectronics, nanophotonics and life sciencies. The focus will be put on modern material processing techniques, which are used today in nanotechnology, for example, electron beam lithography, scanning electron microscopy, etching etc. Practical laboratory work (in the form of a project work) in our modern clean rooms (Lund Nano Lab) is aimed at giving practical knowledge of some important technological methods used in semiconductor nanotechnology. Since it is very important to use a cleanroom environment in nanofabrication, a special attention will be put on cleanroom design, safety and practical work in the cleanroom.

Learning outcomes

Knowledge and understanding
For a passing grade the student must

Competences and skills
For a passing grade the student must

Judgement and approach
For a passing grade the student must

realise the importance of cleanroom environment and cleanroom discipline for successful fabrication and characterization of nanostructures


Lectures, laboratory exercises and a project work
The lectures will start with basics of clean room design, classification standards, sources of particulate contamination, air flow and filtration in the rooms. Unidirectional and non-unidirectional clean rooms will be discussed with a special emphasis for semiconductor nanotechnology applications. We will discuss the importance of high-purity chemicals and gases, including de-ionised water supply. Handling of chemicals and safety aspects of the chemical work will be described in relation with practical exercises in our clean room lab (Lund Nano Lab). In the second part of the lectures, some commonly used nanotechnological methods (e.g. electron beam and nanoimprint lithography, focused ion beams, as well as sample preparation, wet etching, lift-off etc) will be discussed. Short reviews of recently published research papers in nanotechnology will be given.This knowledge will be used later during the practical work in the lab.

The laboratory exercises will be carried out in small groups of 3-4 people and will be guided by persons responsible for the clean room. The laboratory work will start with learning how to use clean room clothes, proper work habits in the clean room environment, practical handling of chemicals and samples and safety issues. Later on, different nanofabrication methods (surface preparation, deposition of resists, oxygen plasma and ozone cleaning etc) will be demonstrated and learned by doing. During this part, such methods of nanofabrication and chracterization as electron beam lithography (EBL), scanning electron microscopy (SEM), evaporation, UV-lithography, nanoimprint (NIL) and others will be learned.

As a final part of the course, technological course projects will be started in order to deepen practical knowledge of the cleanroom work and learn advanced equipment and techniques. The course project will take 4-5 weeks and will focus on a specific research area, relevant to the research activity of the Division of Solid State Physics. Totally 3 course projects will be offered during the course. Actual duration of the project will depend on its complexity and will be adjusted accordingly. The project work will be supervised by PhD-students and/or the staff of the Lund Nano Lab. At the end of the project work a mini-conference with public presentation of the results will be organized.

Examination details

Grading scale: TH
Assessment: The assessment of the course will be performed by a written examination, approval of laboratory exercises and a project work.


Admission requirements:

The number of participants is limited to: 15
Selection: 1. Degree project involving semiconductor processing. 2. At least 15 credits from the following courses: FFF021, FFF042, FAFN15, FFFN05, FFF115 and TEK265. 3. Credits remaining for the degree.
The course might be cancelled: If the number of applicants is less than 2.

Reading list

Contact and other information

Course coordinator: Dr. Ivan Maximov,
Course homepage: